Suwon-si, South Korea

Donok Choi

This inventor holds 3 USPTO granted patents and 2 published patent applications. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2024-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Donok Choi. Retrieved from https://idiyas.com/inventor/donok-choi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 3 

% Patents Active = 100.0

Average Co-Inventor Count = 5.1

ph-index = 1


Company Filing History:


Years Active: 2024-2026

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3 patents (USPTO):Explore Patents

Title: Donok Choi: Innovator in Substrate Processing Technology

Introduction

Donok Choi is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of substrate processing technology. His innovative work has led to the development of a unique apparatus that enhances the efficiency of substrate processing.

Latest Patents

Donok Choi holds a patent for a "Substrate processing apparatus and a method of processing a substrate using the same." This apparatus includes an outer bath and an inner bath, along with a chemical solution supply pipe and an outer gas supply pipe. The design allows for effective processing of substrates, showcasing Choi's ingenuity in engineering.

Career Highlights

Choi is currently employed at Samsung Electronics Ltd., a leading global technology company. His role involves advancing substrate processing technologies, which are crucial for various electronic applications. His expertise has positioned him as a valuable asset within the organization.

Collaborations

Choi has worked alongside talented colleagues, including Junghyun Song and Ansook Sul. Their collaborative efforts contribute to the innovative environment at Samsung Electronics Ltd.

Conclusion

Donok Choi's contributions to substrate processing technology exemplify his commitment to innovation. His patent and work at Samsung Electronics Ltd. highlight his role as a key figure in advancing technological solutions in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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