Company Filing History:
Years Active: 2000
Title: The Innovative Contributions of DongJin Byun
Introduction
DongJin Byun is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of material science, particularly in the development of advanced substrate surface treatments. His work focuses on enhancing the properties of thin films through innovative methods.
Latest Patents
DongJin Byun holds a patent for a pretreatment method for a substrate surface using ion beam radiation. This patent describes a method for modifying an oxide material of a substrate surface to a nitride material by radiating reactive ion particles with a specific amount of energy onto the substrate surface. The thin film deposited on the surface-modified substrate exhibits improved material properties. Notably, a surface treatment using ion beam is executed on an Al₂O₃ substrate to initially form an AlN thin film, followed by the deposition of a GaN thin film on the AlN layer. This process results in a high-quality GaN thin film with superior material properties compared to those produced by prior art methods.
Career Highlights
DongJin Byun is affiliated with the Korea Institute of Science and Technology, where he conducts research and development in advanced materials. His innovative approaches have positioned him as a key figure in the field, contributing to the advancement of technology in substrate treatments.
Collaborations
He has collaborated with notable colleagues, including Seok-Keun Koh and Hyung-Jin Jung, to further enhance the impact of his research. Their combined expertise has led to significant advancements in the field of material science.
Conclusion
DongJin Byun's contributions to the field of material science through his innovative patent and collaborative efforts highlight his role as a leading inventor. His work continues to influence the development of advanced materials and technologies.