Seoul, South Korea

Dong Sun Uh


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: The Innovations of Inventor Dong Sun Uh

Introduction

Dong Sun Uh, an accomplished inventor based in Seoul, South Korea, has made significant contributions to the field of semiconductor technology. His expertise is reflected in his work with Cheil Industries Inc., where he has focused on creating advanced materials that enhance lithographic processes.

Latest Patents

Among his notable achievements, Dong Sun Uh holds a patent for an "Antireflective hardmask composition and methods for using same." This inventive hardmask composition boasts antireflective properties that are particularly useful in lithographic processes. The methods associated with this patent contribute to the fabrication of semiconductor devices, further advancing technological capabilities in the electronics sector.

Career Highlights

Throughout his career at Cheil Industries Inc., Dong Sun Uh has demonstrated exceptional innovation and dedication to his field. His contributions to semiconductor technology, particularly through the development of antireflective hardmask compositions, highlight his role as a key player in advancing electronic manufacturing processes.

Collaborations

Dong Sun Uh has collaborated with esteemed colleagues such as Ji Young Jung and Jae Min Oh, working together to refine their innovative approaches to semiconductor materials. These partnerships have fostered a collaborative environment that drives creativity and enhances the overall quality of their inventions.

Conclusion

Dong Sun Uh’s work exemplifies the spirit of innovation in the semiconductor industry. With his patented antireflective hardmask composition and ongoing collaborations, he continues to contribute significantly to the progress of semiconductor technology at Cheil Industries Inc. His efforts not only reflect personal achievement but also pave the way for future advancements in the field.

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