Company Filing History:
Years Active: 2019-2023
Title: Innovations of Dong Shijie
Introduction
Dong Shijie is a notable inventor based in Wuhan, China. He has made significant contributions to the field of welding and surface modification technologies. With a total of three patents to his name, his work reflects a commitment to advancing industrial processes.
Latest Patents
One of Dong Shijie's latest patents is a welding method and apparatus that involves a fixture for holding a workpiece and a welder. This innovative welding process imposes ultrasonic vibration on the workpiece, enhancing the quality of the weld. The welder operates at different voltages for welding and peening, allowing for improved crystallization of the weld metal. This method can be used for various applications, including welding two parts together or applying a hard facing to a parent metal.
Another significant patent is the electro-spark deposition surface modification process and apparatus. This technology includes a rotationally driven mounting for the workpiece, which is coated using electro-spark deposition. During the crystallization phase, ultrasonic vibration is applied to the deposition layer, enhancing the coating's properties. The apparatus integrates several components, including a vibrating applicator and an ultrasonic generator, to facilitate simultaneous application of electro-spark deposition and ultrasonic vibration.
Career Highlights
Dong Shijie is currently employed at Huys Industries Limited, where he continues to innovate in the field of welding and surface modification. His work has garnered attention for its practical applications in various industrial settings.
Collaborations
Dong has collaborated with notable coworkers, including Luo Ping and Chang Ying, who contribute to his innovative projects.
Conclusion
Dong Shijie's contributions to welding and surface modification technologies demonstrate his expertise and commitment to innovation. His patents reflect a forward-thinking approach that enhances industrial processes and applications.