Dong Ho Yoon

Title: Innovations of Dong Ho Yoon in Graphene Technology

Introduction

Dong Ho Yoon is a prominent inventor based in Seoul, South Korea. He is known for his significant contributions to the field of graphene technology. His innovative methods have the potential to revolutionize various applications in electronics and materials science.

Latest Patents

One of Dong Ho Yoon's notable patents is titled "Method for depositing large-area graphene layer and apparatus for continuous graphene deposition." This patent describes a method for depositing a large-area graphene layer using a titanium layer formed on a substrate. The process involves reducing the titanium layer with a reductant gas and subsequently forming graphene by spraying a reactant gas onto the titanium layer. This innovative approach allows for efficient and continuous graphene deposition.

Career Highlights

Dong Ho Yoon has made significant strides in his career, particularly through his work at Kuk-il Graphene Co., Ltd. His expertise in graphene technology has positioned him as a key figure in the industry. He holds 1 patent that showcases his innovative capabilities and dedication to advancing graphene applications.

Collaborations

Dong Ho Yoon has collaborated with notable colleagues, including Chul Kyu Song and Ji Hye Han. These partnerships have further enhanced his research and development efforts in the field of graphene technology.

Conclusion

Dong Ho Yoon's contributions to graphene technology through his innovative patent demonstrate his commitment to advancing this field. His work at Kuk-il Graphene Co., Ltd. and collaborations with esteemed colleagues highlight his role as a leading inventor in the industry.