Company Filing History:
Years Active: 1999-2002
Title: The Innovations of Dong-chul Kwon
Introduction
Dong-chul Kwon is a prominent inventor based in Suwon, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving the reliability and efficiency of semiconductor devices.
Latest Patents
One of his latest patents is a semiconductor device featuring an improved metal line structure and a manufacturing method for it. This innovative device includes a first dielectric layer formed on a semiconductor substrate, a metal film pattern on the first dielectric layer, and an interface protection layer on the metal film pattern. Additionally, a second dielectric layer is placed on the interface protection layer, which contains a reactive material, such as fluorine. The interface protection layer prevents the fluorine from diffusing to the metal film pattern, thereby avoiding the formation of a damage film, like metal fluoride. This damage film is highly resistive and could compromise the reliability of the metal film pattern and the overall semiconductor device.
Career Highlights
Dong-chul Kwon is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor devices, ensuring they meet the demands of modern technology.
Collaborations
He has collaborated with notable coworkers, including Young-jin Wee and Hong-Jae Shin, contributing to various projects that enhance semiconductor performance and reliability.
Conclusion
Dong-chul Kwon's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of reliable and efficient semiconductor devices.