Westford, MA, United States of America

Donald W Ahern


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: The Innovations of Donald W. Ahern

Introduction

Donald W. Ahern is a notable inventor based in Westford, MA, who has made significant contributions to the field of deposition systems. He holds a patent for a unique technology that enhances the efficiency of sputtering processes. His work is particularly relevant in industries that require precise material deposition techniques.

Latest Patents

Ahern's most recent patent is titled "Multisurface simultaneous sputtering and shuttering." This innovative deposition system features a vacuum chamber with a cylindrical inner wall and a parts carousel that operates concentrically within it. The system includes multiple deposition sources that deliver material onto the carousel. A key component of this invention is the cylindrical shutter assembly, which can transition between a shuttered position, blocking the deposition sources, and an unshuttered position, allowing for material deposition. This design enables enhanced control over the deposition process, making it a valuable advancement in the field.

Career Highlights

Donald W. Ahern is currently employed at Materion GmbH, where he applies his expertise in material science and engineering. His work at the company focuses on developing advanced technologies that improve manufacturing processes. Ahern's contributions have been instrumental in driving innovation within the organization.

Collaborations

Throughout his career, Ahern has collaborated with talented professionals, including Zan Aslett and Michael P. Newell. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Donald W. Ahern's innovative work in the field of deposition systems exemplifies the impact of engineering advancements on modern manufacturing. His patent for multisurface simultaneous sputtering and shuttering showcases his commitment to improving technology in this area. Ahern's contributions continue to influence the industry and inspire future innovations.

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