Company Filing History:
Years Active: 1978
Title: The Innovative Contributions of Donald R. Dyer
Introduction
Donald R. Dyer is a notable inventor based in Wappingers Falls, NY. He has made significant contributions to the field of integrated circuit technology. His innovative methods have paved the way for advancements in thin film patterning.
Latest Patents
Donald R. Dyer holds a patent for a method of forming thin film patterns by differential pre-baking of resist. This method involves depositing patterned thin films on an integrated circuit substrate. It begins with forming a layer of positive photoresist material on the substrate and heating it to partially cure the photoresist. The process ensures that the surface of the photoresist interfacing with the substrate remains at a lower temperature than the opposite surface. This results in the upper portion of the photoresist layer being cured more than the lower portion. After exposing the photoresist layer to a selected pattern of light, a developer is applied. The developer removes the less cured interfacing portion at a higher rate than the more cured upper layer. This creates an aperture pattern corresponding to the light pattern, producing a negative slope or 'overhang' type lift-off mask. This mask is critical for forming thin film patterns by lift-off techniques. Finally, a selected thin film is deposited onto the substrate through the apertures, utilizing the photoresist mask as a deposition mask.
Career Highlights
Donald R. Dyer is associated with International Business Machines Corporation (IBM), where he has contributed to various projects and innovations. His work has been instrumental in enhancing the capabilities of integrated circuits.
Collaborations
Throughout his career, Dyer has collaborated with notable colleagues, including Claude Johnson, Jr. and Robert R. Wilbarg. These collaborations have further enriched his contributions to the field.
Conclusion
Donald R. Dyer's innovative methods in thin film patterning have significantly impacted the integrated circuit industry. His patent reflects a deep understanding of material science and engineering principles. His work continues to influence advancements in technology today.
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