Donald J Hunt

Title: The Innovations of Donald J Hunt

Introduction

Donald J Hunt is a notable inventor based in Pine Bush, NY (US). He has made significant contributions to the field of technology, particularly through his innovative patents. With a total of 3 patents, Hunt has demonstrated his expertise and creativity in developing advanced methods and apparatuses.

Latest Patents

Hunt's latest patents include a method for fabricating multi-layer thin film structures. This method involves a unique approach to releasing a workpiece from a substrate. It includes providing a substrate that is transparent to a predetermined wavelength of electromagnetic radiation. A separation layer is formed on the substrate, which degrades in response to the predetermined radiation. The workpiece is then placed on the separation layer, and the radiation is directed at the separation layer through the transparent substrate. This process effectively degrades the separation layer, allowing the workpiece to be separated from the substrate.

Another significant patent by Hunt focuses on a parallel processing method for similar applications. This innovation also utilizes the same principles of transparency and degradation to enhance the efficiency of workpiece release from substrates.

Career Highlights

Donald J Hunt is currently associated with International Business Machines Corporation (IBM). His work at IBM has allowed him to collaborate with some of the brightest minds in the industry, contributing to groundbreaking advancements in technology.

Collaborations

Hunt has worked alongside talented colleagues such as Gnanalingam Arjavalingam and Alina Deutsch. Their collaborative efforts have further propelled the innovative projects they have undertaken.

Conclusion

Donald J Hunt's contributions to the field of technology through his patents and collaborations highlight his role as a significant inventor. His innovative methods for fabricating multi-layer thin film structures demonstrate his commitment to advancing technology.