Poughkeepsie, NY, United States of America

Donald F Schomaker


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 49(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: The Innovations of Donald F. Schomaker

Introduction

Donald F. Schomaker is a notable inventor based in Poughkeepsie, NY. He has made significant contributions to the field of integrated circuit testing. With a focus on enhancing the efficiency of decoupling capacitors, Schomaker's work has implications for various electronic applications.

Latest Patents

Schomaker holds a patent for a "Low inductance side mount decoupling test structure." This innovative integrated circuit test structure features a stacked substrate MLC space transformer. The design incorporates a top surface of an interface substrate for decoupling capacitor placement. Metal conductors are exposed on the top surface for terminating power supply buses from a tester. The personalization substrate is engineered to extend internal power plane metalization to the sidewalls, enhancing the overall performance of the test structure.

Career Highlights

Schomaker is associated with the International Business Machines Corporation (IBM), where he has contributed to various projects. His expertise in integrated circuit design and testing has positioned him as a valuable asset within the company. His work has led to advancements in the efficiency and effectiveness of electronic components.

Collaborations

Throughout his career, Schomaker has collaborated with notable colleagues, including Donald J. Papae and Michael Anthony Sorna. These collaborations have fostered innovation and have contributed to the development of cutting-edge technologies in the field.

Conclusion

Donald F. Schomaker's contributions to integrated circuit testing and design exemplify the spirit of innovation. His patent for a low inductance decoupling test structure showcases his commitment to enhancing electronic performance. Schomaker's work continues to influence the industry and inspire future advancements.

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