Company Filing History:
Years Active: 2018
Title: Don Person - Innovator in Chalcogenide Semiconductor Technology
Introduction
Don Person is a notable inventor based in Milpitas, California. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods for sputter deposition of alkali metal-containing precursor films. His work has implications for the fabrication of chalcogenide semiconductors, which are essential in various microelectronic devices.
Latest Patents
Don Person holds a patent titled "High rate sputter deposition of alkali metal-containing precursor films useful to fabricate chalcogenide semiconductors." This invention provides methods to sputter deposit films comprising alkali metal compounds. The process involves sputtering at least one target that includes alkali metal compounds and metallic components to form sputtered films. The atomic ratio of the alkali metal compound to the metallic component ranges from 15:85 to 85:15. The resulting sputtered films are incorporated into a precursor structure that, when heated in the presence of chalcogen, forms a chalcogenide semiconductor. This semiconductor can contain up to 2 atomic percent of alkali metal content, primarily derived from the sputtered films. These chalcogenide semiconductors are particularly useful in microelectronic devices, including solar cells.
Career Highlights
Don Person is associated with Nuvosun, Inc., where he continues to innovate in the field of semiconductor technology. His work has been instrumental in advancing the methods used for the fabrication of chalcogenide semiconductors, which are critical for the development of efficient microelectronic devices.
Collaborations
Throughout his career, Don has collaborated with notable colleagues, including Dennis R. Hollars and Puthur Paulson. These collaborations have contributed to the advancement of technology in the semiconductor industry.
Conclusion
Don Person's contributions to the field of semiconductor technology, particularly through his patented methods for sputter deposition, highlight his role as an innovator. His work not only advances the technology but also supports the development of essential microelectronic devices.