Company Filing History:
Years Active: 2000-2007
Title: Don D Eisenhour: Innovator in Chemical-Mechanical Polishing Technologies
Introduction
Don D Eisenhour, an accomplished inventor based in Grayslake, IL, has made significant contributions to the field of chemical-mechanical polishing (CMP) with a total of eight patents to his name. His innovative work primarily focuses on compositions and methods that enhance the planarization of surfaces, particularly in semiconductor applications.
Latest Patents
Eisenhour's latest patents include groundbreaking methods for chemical-mechanical polishing and planarizing surfaces such as computer memory disk surfaces and semiconductor wafers. His patented compositions typically comprise a liquid carrier and purified clay, along with optional additives like a chemical accelerator and complexing agents. These innovations are designed to effectively carry away removed metal and insulating particles during the polishing process, preventing them from re-adhering to the surface.
Specifically, his patents detail methods for:
1. Planarizing or polishing computer memory disk surfaces using a slurry comprised of a liquid carrier and purified clay along with optional additives.
2. Polishing corundum, Gallium Arsenide (GaAs), Gallium Phosphide (GaP), and their alloys using compositions that include smectite clay and abrasive particles.
Career Highlights
Throughout his career, Don D Eisenhour has worked with prominent companies such as Amcol International Corporation and American Colloid Company. His experiences at these organizations have contributed significantly to his understanding and expertise in the field of polishing compositions and methods.
Collaborations
Eisenhour has collaborated with notable individuals in his field, including Mingming Fang and Michael R Ianiro. These partnerships have fostered innovation and have resulted in the development of effective solutions in the realms of CMP technologies.
Conclusion
Don D Eisenhour stands out as a prominent inventor in the intricate field of chemical-mechanical polishing. His eight patents reflect his deep dedication to enhancing surface planarization processes, particularly in the semiconductor industry. Through his consistent innovation and collaboration with industry professionals, Eisenhour continues to pave the way for advancements in polishing technologies.