Madison, WI, United States of America

Dmitri Kowalevskii


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 1998

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Dmitri Kowalevskii: Innovator in Power Supply Technology

Introduction

Dmitri Kowalevskii is a notable inventor based in Madison, WI (US). He has made significant contributions to the field of power supply technology, particularly in the development of systems for magnetron sputtering devices. His innovative approach has led to the creation of a unique power supply that enhances the efficiency and functionality of these devices.

Latest Patents

Dmitri holds a patent for a "Low-frequency modulated current mode power supply for magnetron." This invention provides a power supply for driving two magnetron sputtering devices in a bipolar mode. The design includes current pulse circuits for each magnetron, converting the positive and negative voltage outputs of a DC electrical power source into a train of regulated current pulses with independently adjustable durations. The system is versatile, allowing for the operation of one magnetron in a unipolar mode or both in a bipolar mode. Additionally, the current pulse circuit can be utilized independently for other devices, showcasing its adaptability.

Career Highlights

Dmitri Kowalevskii is currently employed at Photran Corporation, where he continues to innovate and develop advanced technologies. His work has been instrumental in enhancing the capabilities of magnetron sputtering systems, contributing to advancements in various applications.

Collaborations

Dmitri collaborates with Michael Kishinevsky, working together to push the boundaries of power supply technology and improve the efficiency of their inventions.

Conclusion

Dmitri Kowalevskii's contributions to power supply technology, particularly through his patented innovations, highlight his role as a significant inventor in the field. His work continues to influence advancements in magnetron sputtering devices and beyond.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…