Diane Cecile Howell

Title: The Innovative Contributions of Diane Cecile Howell

Introduction

Diane Cecile Howell is a notable inventor based in Saratoga, CA (US). She has made significant contributions to the field of semiconductor technology, particularly in the area of photoresist ashing processes. Her work has implications for the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

Diane holds a patent for a process titled "Photoresist ashing process for organic and inorganic polymer dielectric materials." This innovative process focuses on the removal of photoresist present on a polymer dielectric on a semiconductor substrate. It also addresses the removal of photoresist residues on the inside walls of microvias formed in the dielectric layer. The process involves generating a plasma from a gas comprising one or more fluorine compound containing etchant gases. The etching is conducted at temperatures ranging from about 0°C to about 90°C and at pressures of about 10 torr or less. This method effectively removes the photoresist present on the dielectric layer and the inside walls of microvias.

Career Highlights

Diane's career is marked by her dedication to advancing semiconductor technology. Her innovative patent demonstrates her expertise and commitment to improving manufacturing processes in the industry.

Collaborations

Diane has worked alongside talented individuals such as Jude Menlo Dunne and Joseph P Kennedy. Their collaboration has likely contributed to the success of her innovative projects.

Conclusion

Diane Cecile Howell's contributions to semiconductor technology through her patent on photoresist ashing processes highlight her role as a significant inventor in the field. Her work continues to influence advancements in semiconductor manufacturing.