Salisbury, MA, United States of America

Diana C Gronski

USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Diana C Gronski: Innovator in Insulator Technology

Introduction

Diana C Gronski is a notable inventor based in Salisbury, MA (US). She has made significant contributions to the field of insulator technology, particularly with her innovative designs that enhance performance and reliability.

Latest Patents

Diana holds 1 patent for her invention titled "Helical Voltage Standoff." This patent describes an insulator featuring a helical protrusion that spirals around the shaft. The design includes a lip at the distal end of the helical protrusion, which creates regions on the shaft that are shielded from material deposition. By optimizing the sizing of the threads, helical protrusion, and lip, the line-of-sight to the interior wall of the shaft is significantly reduced. This innovation leads to longer operational times before failure, making it particularly useful in ion implantation systems where physical and electrical separation of components is crucial.

Career Highlights

Diana is currently employed at Applied Materials, Inc., where she continues to develop cutting-edge technologies in the semiconductor industry. Her work focuses on improving the efficiency and durability of insulators used in various applications.

Collaborations

Diana collaborates with talented professionals such as Alicia Chen and Craig Richard Chaney, contributing to a dynamic team environment that fosters innovation and creativity.

Conclusion

Diana C Gronski's contributions to insulator technology exemplify her commitment to innovation and excellence in her field. Her patented designs not only enhance performance but also pave the way for advancements in semiconductor applications.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…