Location History:
- Taoyuan, TW (1991 - 1994)
- Taoyuan Hsien, TW (1998)
- Hsinchu, TW (1994 - 2006)
Company Filing History:
Years Active: 1991-2006
Title: Dhei-Jhai Lin: Innovator in Color Filter and Photomask Technologies
Introduction
Dhei-Jhai Lin is a prominent inventor based in Taoyuan, Taiwan. He has made significant contributions to the fields of color filter and photomask technologies. With a total of 8 patents to his name, Lin has developed innovative methods that enhance the efficiency and effectiveness of these technologies.
Latest Patents
One of Lin's latest patents is a method for making a color filter that includes attaching a mold to a substrate and then filling it with a photopolymer solution. This method simplifies the conventional photolithographic process, which is often time-consuming and requires multiple repetitions. The steps involve providing a removable mold with an intaglio surface, attaching it to a transparent substrate, filling the channel units with a photopolymer solution containing colorants, applying ultraviolet light to cure the polymer, and finally removing the mold to reveal the patterned polymer layer.
Another notable patent is an improved method for preparing multiple-exposure photomasks with varying levels of transmissivity. This method begins with the formation of a bi-exposure photomask that contains different exposed areas on a transparent substrate. A diffractive-refractive light-scattering optical element is then formed above the microscopically exposed area, allowing for adjustable transmissivity. This innovation enables the creation of multiple microscopic patterns on the same substrate, facilitating the achievement of various intermediate transmissivities.
Career Highlights
Dhei-Jhai Lin has worked with esteemed organizations such as the Industrial Technology Research Institute and Polyoptocom Corporation. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking advancements in his field.
Collaborations
Lin has collaborated with notable coworkers, including Jim-Chyuan Shieh and Hsien-Kuang Lin. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Dhei-Jhai Lin's contributions to color filter and photomask technologies demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in these fields, and his work continues to influence advancements in technology.