Bengaluru, India

Devi Raghavee Veerappan


Average Co-Inventor Count = 5.6

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2023-2024

where 'Filed Patents' based on already Granted Patents

3 patents (USPTO):

Title: Innovations of Devi Raghavee Veerappan

Introduction

Devi Raghavee Veerappan is a notable inventor based in Bengaluru, India. She has made significant contributions to the field of substrate processing technology. With a total of 3 patents to her name, her work has garnered attention in the industry.

Latest Patents

One of her latest patents is a gas diffuser, specifically a symmetric pump down mini-volume with laminar flow cavity gas injection for high and low pressure. This innovative system provides a substrate processing assembly that utilizes laminar flow cavity gas injection. The design includes a dual gas reservoir assembly positioned within a lower shield assembly, enhancing the efficiency of gas delivery in substrate processing chambers.

Career Highlights

Devi Raghavee Veerappan has been associated with Applied Materials, Inc., a leading company in the field of materials engineering. Her work focuses on improving substrate processing techniques, which are crucial for various applications in semiconductor manufacturing.

Collaborations

Throughout her career, she has collaborated with talented individuals such as Kirankumar Neelasandra Savandaiah and Srinivasa Rao Yedla. These collaborations have contributed to the advancement of her innovative projects.

Conclusion

Devi Raghavee Veerappan's contributions to the field of substrate processing technology highlight her role as a pioneering inventor. Her patents reflect her commitment to innovation and excellence in engineering.

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