Location History:
- Holyoke, MA (US) (2013 - 2016)
- Cambridge, MA (US) (2023)
Company Filing History:
Years Active: 2013-2023
Title: Desiree L Plata: Innovator in Sustainable Materials and Nanotechnology
Introduction
Desiree L Plata is a prominent inventor based in Holyoke, MA (US). She has made significant contributions to the fields of sustainable materials and nanotechnology. With a total of 3 patents, her work focuses on innovative solutions that address environmental challenges.
Latest Patents
One of her latest patents is for biodegradable sustainable polyesters. This invention discloses a copolymer comprising a hydroxyacid, which is biodegradable with a decomposition temperature substantially higher than its melting temperature. Additionally, she has developed a method for synthesizing a poly(pivalolactone-co-caprolactone) copolymer. Another notable patent is related to alkyne-assisted nanostructure growth. This invention pertains to the formation and processing of nanostructures, including nanotubes. It provides processes for nanostructure growth under relatively mild conditions, such as low temperatures. The methods improve catalyst efficiency and reduce the production of undesired byproducts, thereby minimizing the environmental and public health impacts associated with nanostructure fabrication.
Career Highlights
Desiree has worked at prestigious institutions, including the Massachusetts Institute of Technology and the University of Michigan. Her experience in these renowned organizations has allowed her to advance her research and contribute to significant technological advancements.
Collaborations
Some of her notable coworkers include Anastasios John Hart and Eric R Meshot. Their collaborative efforts have further enriched her research and innovation endeavors.
Conclusion
Desiree L Plata is a trailblazer in the fields of sustainable materials and nanotechnology. Her innovative patents and contributions to research institutions highlight her commitment to addressing environmental challenges through technology.