Amity, OR, United States of America

Dennis M Dudek


Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 11(Granted Patents)


Location History:

  • Sherwood, OR (US) (2004)
  • Amity, OR (US) (2007)

Company Filing History:


Years Active: 2004-2007

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2 patents (USPTO):Explore Patents

Title: Innovations by Dennis M. Dudek - Pioneering Wear Resistant Technologies

Introduction

Dennis M. Dudek, an innovative inventor based in Amity, Oregon, has made significant contributions to the field of electrophotographic systems. With two patents to his name, Dudek focuses on enhancing the performance and durability of components used in copy machines through advanced material applications.

Latest Patents

Dudek’s latest patents showcase his expertise in creating novel materials with improved durability and thermal conductivity. The first patent, titled "Wear Resistant Fluoropolymer," describes a fluoroelastomer loaded with an inorganic filler that is coupled to the fluoroelastomer by a titanate, zirconate, or aluminate. This innovative material functions as a base layer and/or a release layer on fuser, transfix, receiver, or rheological transfer members in copy machines. The tightly bonded fillers significantly decrease the wear rate of the member while also enhancing thermal conductivity, making it desirable for fusing applications.

His second patent, "Electrophotographic System with Member Formed from Boron Nitride Filler Coupled to a Silane," describes an electrophotographic system featuring a member that includes both a surface layer and a base layer. The surface layer is made from a composition that combines a fluoroelastomer with boron nitride filler, which is coupled with a silane. This innovative approach improves the functionality and reliability of the components involved in the electrophotographic process.

Career Highlights

Dennis M. Dudek is currently employed by Xerox Corporation, where he leverages his expertise in materials science to enhance the performance of copy machine components. His contributions to the development of wear-resistant materials have positioned him as a key player in the technical advancements of the company.

Collaborations

Throughout his career, Dudek has collaborated with fellow innovator Patrick James Finn. Together, they have worked on several projects aimed at advancing the capabilities of electrophotographic systems and have contributed to the body of knowledge surrounding durable material applications in the printing industry.

Conclusion

In summary, Dennis M. Dudek is a notable inventor whose work on wear-resistant fluoropolymers and advanced materials has significantly influenced the performance of electrophotographic systems. His patents not only highlight his innovative spirit but also underscore the importance of collaboration in driving technological advancements within the industry.

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