Company Filing History:
5 out of 22,242 
1 out of 832,843 Years Active: 1995-2003
Title: The Innovative Contributions of Dennis L Dull
Introduction
Dennis L Dull is a notable inventor based in Sumner, WA (US). He has made significant contributions to the field of technology, particularly in the area of precision etched radomes. With a total of 6 patents to his name, Dull's work showcases his expertise and innovative spirit.
Latest Patents
Among his latest patents is the "Precision Etched Radome," which focuses on improving multicurved copper films with fine-line elements. This innovation allows for cutting elements with reproducible precision to close tolerances, typically line widths of 3-10±0.25 mil, using an etchant that comprises a concentrated saline solution of CuCl. Another significant patent is the "Etching Method," which also emphasizes the precision cutting of multicurved copper films for radome applications.
Career Highlights
Throughout his career, Dennis L Dull has worked with prominent companies, including The Boeing Company. His experience in such a reputable organization highlights his skills and the value he brings to the field of invention.
Collaborations
Dull has collaborated with various professionals in his field, including Diane C Rawlings and Florian B Mansfeld. These collaborations have likely contributed to the success of his innovative projects.
Conclusion
Dennis L Dull's contributions to technology through his patents and collaborations reflect his dedication to innovation. His work continues to influence advancements in the field of precision etched radomes.