Rochester, NY, United States of America

Dennis J Savage


Average Co-Inventor Count = 3.4

ph-index = 5

Forward Citations = 86(Granted Patents)


Company Filing History:


Years Active: 1980-2007

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9 patents (USPTO):Explore Patents

Title: Innovations of Dennis J Savage

Introduction

Dennis J Savage is a notable inventor based in Rochester, NY (US). He has made significant contributions to the field of conductive materials, holding a total of 9 patents. His work primarily focuses on the development of electronically conductive polymers and their applications.

Latest Patents

One of his latest patents is titled "Conductive polymers on acicular substrates." This invention relates to an electronically conductive particle that comprises an acicular substrate in contact with an electronically conductive polymer. Another embodiment of this patent includes an article that features electronically conductive particles with similar components. Additionally, he has developed a method for creating these particles, which involves providing at least one acicular substrate, combining it with at least one monomer, and mixing in a catalyst. Another significant patent is "Antistatic layer with electrically conducting polymer for imaging element." This invention describes an imaging element that includes a support, an image-forming layer, and an electrically-conductive layer composed of a sulfonated polyurethane film-forming binder and an electrically-conductive polymer.

Career Highlights

Dennis J Savage has had a distinguished career, primarily working with Eastman Kodak Company. His innovative work has contributed to advancements in imaging technology and materials science.

Collaborations

Throughout his career, he has collaborated with notable colleagues, including Debasis Majumdar and Thomas W Martin. These collaborations have further enhanced the impact of his inventions in the industry.

Conclusion

Dennis J Savage's contributions to the field of conductive materials and imaging technology are noteworthy. His innovative patents and collaborations reflect his commitment to advancing technology in meaningful ways.

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