Company Filing History:
Years Active: 2025
Title: Deepthy M George: Innovator in Maskless Lithography Systems
Introduction
Deepthy M George is a prominent inventor based in Santa Clara, CA (US). She has made significant contributions to the field of lithography through her innovative work at Applied Materials, Inc. Her expertise in digital lithography has led to advancements that enhance the efficiency and precision of substrate patterning.
Latest Patents
Deepthy holds a patent for a "Process, system, and software for maskless lithography systems." This invention involves systems, methods, and software that pattern substrates using digital lithography controlled by field programmable gate arrays (FPGA). The process includes providing stage position data to the FPGA from the lithography environment, which is then loaded into memory. A graphics processing unit reads this data and calculates instructions based on it. Ultimately, a portion of the substrate on the stage is processed using instructions provided by the FPGA. She has 1 patent to her name.
Career Highlights
Throughout her career, Deepthy has demonstrated a strong commitment to innovation in the field of lithography. Her work at Applied Materials, Inc. has positioned her as a key player in the development of advanced lithography systems.
Collaborations
Deepthy has collaborated with talented individuals such as Zheng Gu and Yujiao Huang, contributing to a dynamic work environment that fosters innovation and creativity.
Conclusion
Deepthy M George is a trailblazer in the field of maskless lithography systems, with her innovative patent showcasing her expertise and dedication to advancing technology. Her contributions continue to impact the industry positively.