Company Filing History:
Years Active: 1996
Title: The Innovative Contributions of Deborah K Rodriguez
Introduction
Deborah K Rodriguez is a notable inventor based in Palm Bay, FL (US). She has made significant contributions to the field of semiconductor technology, particularly through her innovative patent. Her work exemplifies the intersection of creativity and technical expertise in the realm of engineering.
Latest Patents
Rodriguez holds a patent for a "Fill and etchback process using dual photoresist sacrificial layer." This invention is designed to planarize an oxide-filled shallow trench-isolated semiconductor architecture. The process involves forming a composite photoresist sacrificial layer on the oxide-filled structure, which contains photoresist plugs that are reflowed to fill depressions in the oxide fill layer. The subsequent application of selective etching chemistries allows for the effective etching of both the sacrificial photoresist layer and the trench fill oxide layer, ensuring that the top surface of the trench fill oxide layer remains above the mesa surface to prevent shorting with a polysilicon gate layer.
Career Highlights
Rodriguez's career is marked by her role at Harris Corporation, where she has contributed to various projects and innovations. Her expertise in semiconductor processes has positioned her as a valuable asset within the company.
Collaborations
Throughout her career, Rodriguez has collaborated with talented individuals such as Jeanne Marie McNamara and David H Leebrick. These collaborations have fostered an environment of innovation and have led to advancements in their respective fields.
Conclusion
Deborah K Rodriguez's contributions to semiconductor technology through her patent and work at Harris Corporation highlight her role as an influential inventor. Her innovative processes continue to impact the industry and inspire future advancements.