Company Filing History:
Years Active: 2005-2006
Title: Innovations of Deborah Anne Schorr
Introduction
Deborah Anne Schorr is a prominent inventor based in Cincinnati, OH. She has made significant contributions to the field of thermal barrier coatings, holding 2 patents that showcase her innovative approach to materials engineering. Her work is particularly relevant in industries that require advanced protective coatings for metal substrates.
Latest Patents
One of her latest patents is a method for applying or repairing thermal barrier coatings. This method involves applying a thermal barrier coating to a metal substrate or repairing a previously applied coating. The process includes treating an aluminide diffusion coating to enhance its adherence to a plasma spray-applied overlay alloy bond coat layer. The final result is a robust thermal barrier coating that improves the durability of metal components.
Another notable patent focuses on a nickel-base superalloy with a thermal barrier coating system. This invention features a substrate made from a metal alloy containing ruthenium and various refractory elements. The coating system significantly enhances spallation resistance, making it ideal for high-performance applications.
Career Highlights
Deborah works at General Electric Company, where she continues to push the boundaries of innovation in materials science. Her expertise in thermal barrier coatings has positioned her as a leader in her field, contributing to advancements that benefit various industries.
Collaborations
Throughout her career, Deborah has collaborated with talented individuals such as Bangalore Aswatha Nagaraj and Eva Zielonka Lanman. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Deborah Anne Schorr's contributions to the field of thermal barrier coatings exemplify her innovative spirit and dedication to advancing materials science. Her patents reflect a commitment to improving the performance and durability of metal substrates in demanding applications.