Wilsonville, OR, United States of America

David William Kamp

USPTO Granted Patents = 4 

Average Co-Inventor Count = 5.3

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2020-2023

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4 patents (USPTO):

Title: Innovations of David William Kamp

Introduction

David William Kamp is a notable inventor based in Wilsonville, Oregon. He has made significant contributions to the field of substrate processing systems, holding a total of four patents. His work focuses on enhancing the efficiency and functionality of showerhead faceplates used in plasma generation.

Latest Patents

One of his latest patents is titled "Showerhead faceplate having flow apertures configured for hollow cathode discharge suppression." This innovative faceplate features a bottom side that faces a plasma generation region and a top side that faces a plenum where process gas is supplied. The design includes apertures formed through the bottom side and openings through the top side. Each aperture extends through a portion of the faceplate's thickness, intersecting with at least one opening to create a flow path for process gas. The cross-section of each aperture is designed to suppress hollow cathode discharge in at least one direction, while the openings have a smallest cross-sectional dimension greater than this suppression dimension.

Career Highlights

David William Kamp is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to develop and patent innovative technologies that improve substrate processing systems.

Collaborations

Some of his notable coworkers include Timothy Scott Thomas and Michael John Selep, who have collaborated with him on various projects within the company.

Conclusion

David William Kamp's contributions to the field of substrate processing through his innovative patents demonstrate his expertise and commitment to advancing technology. His work continues to influence the industry and improve the efficiency of plasma generation systems.

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