David W Todd

Title: The Innovative Contributions of David W Todd

Introduction

David W Todd is a notable inventor based in Sebastopol, CA (US). He has made significant contributions to the field of materials science, particularly in the development of barrier films. With a total of 6 patents to his name, Todd's work has had a considerable impact on various industries.

Latest Patents

One of Todd's latest patents is for a barrier film that boasts high colorless transparency. This innovative film comprises a flexible plastic substrate with a barrier layer formed on its surface. The barrier layer has a thickness ranging from approximately 50 to less than 200 Angstroms and is made from materials such as aluminum oxide, tin oxide, and yttrium oxide. Additionally, an extra barrier layer made of silicon dioxide may also be applied on top of the primary barrier layer. This invention showcases Todd's commitment to advancing material technology.

Career Highlights

Throughout his career, David W Todd has worked with several prominent companies, including Flex Products, Inc. and JDS Uniphase Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking projects in the field of barrier films and materials.

Collaborations

Todd has collaborated with notable individuals in his field, including Roger Winston Phillips and Lauren R Wendt. These partnerships have further enriched his work and expanded the scope of his innovations.

Conclusion

David W Todd's contributions to the field of materials science, particularly through his innovative barrier films, highlight his role as a significant inventor. His patents and collaborations reflect a dedication to advancing technology and improving material applications.