Fort Collins, CO, United States of America

David W Grainger


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: David W. Grainger: Innovator in Surface Coating Technologies

Introduction

David W. Grainger is a notable inventor based in Fort Collins, Colorado. He has made significant contributions to the field of surface coatings, particularly through his innovative patent that addresses non-specific binding issues in functional thin films. His work is essential for various applications in biotechnology and materials science.

Latest Patents

David W. Grainger holds a patent for a hydroxyl functional surface coating. This patent describes compositions and methods for preparing functional thin films or surface coatings that exhibit low non-specific binding. The thin films contain specified functional groups and non-specific binding repellant components. These components significantly reduce non-specific binding to the modified solid surfaces while maintaining the activity of the specified functional groups. The methods involve anchoring specified functional groups to solid substrates through a spacer, resulting in surface coatings that can specifically recognize target proteins while limiting non-specific protein binding.

Career Highlights

David W. Grainger is associated with Accelr8 Technology Corporation, where he applies his expertise in surface coating technologies. His innovative approach has led to advancements in the development of functional materials that are crucial for various scientific and industrial applications.

Collaborations

David has collaborated with notable colleagues, including Guoqiang Mao and Steven W. Metzger. Their combined efforts contribute to the ongoing research and development in the field of surface coatings and functional materials.

Conclusion

David W. Grainger's work in hydroxyl functional surface coatings exemplifies the importance of innovation in addressing complex challenges in material science. His contributions continue to influence advancements in the field, showcasing the potential of functional thin films in various applications.

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