David Totedo

Title: David Totedo: Innovator in RF Power Technology

Introduction

David Totedo is a notable inventor based in Austin, TX, who has made significant contributions to the field of radio frequency (RF) power technology. With a focus on enhancing the efficiency of plasma chambers, Totedo's work is pivotal in various industrial applications.

Latest Patents

David Totedo holds a patent for "Methods and apparatus for supplying RF power to plasma chambers." This invention involves methods and apparatus for matching the impedance of a process chamber with that of an RF power source. The patent outlines a method that dynamically matches the load impedance of the process chamber with an impedance matching circuit. This circuit is designed to compensate for changes in load impedance, ensuring optimal performance over a wide range of conditions. The invention also includes filtering mechanisms to manage power feedback and residual signals effectively.

Career Highlights

Totedo is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His role involves developing innovative solutions that enhance the performance of semiconductor manufacturing processes. His expertise in RF power technology has positioned him as a key contributor to the company's advancements.

Collaborations

Throughout his career, David Totedo has collaborated with talented professionals such as Smbat Kartashyan and Kartik Ramaswamy. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

David Totedo's contributions to RF power technology exemplify the impact of innovative thinking in industrial applications. His patent and work at Applied Materials, Inc. highlight his commitment to advancing technology in the field.