Broome, NY, United States of America

David Scheel


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: David Scheel: Innovator in Scan Strategy Development

Introduction

David Scheel is an accomplished inventor based in Broome, NY, known for his contributions to the field of scan strategies. With a focus on usability and efficiency, his innovations aim to simplify complex processes for users. His dedication to advancing technology has earned him recognition in the realm of patents and innovation.

Latest Patents

David holds one patent titled "Methods and apparatus for creating a scan strategy." This invention is noteworthy for its unique approach to generating a scan strategy based on user-input parameters. One of the key benefits of his design is that it eliminates the need for users to have knowledge of the receiver hardware specifics or the particular signal characteristics of the emitters they wish to detect. This user-centric methodology enhances accessibility and efficiency in various technological applications.

Career Highlights

David is employed at Lockheed Martin Corporation, a leading aerospace and defense company known for its cutting-edge technologies and innovative solutions. His tenure at Lockheed Martin has allowed him to contribute to significant projects and foster advancements in engineering and technology, solidifying his role as a valuable asset to the company.

Collaborations

Throughout his career, David has collaborated with several talented professionals, including Scott Kunz and Jerry L. Twoey. These collaborations have not only enriched his work environment but have also contributed to the successful development of innovative solutions within their projects.

Conclusion

David Scheel is a notable inventor whose work on generating user-friendly scan strategies reflects his commitment to innovation. Through his patent and collaborations at Lockheed Martin Corporation, he continues to make strides in improving technology. His contributions serve as an inspiration for aspiring inventors seeking to create more accessible and efficient solutions in complex fields.

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