Company Filing History:
Years Active: 2000-2002
Title: David N Michelen: Innovator in Electroplating Technology
Introduction
David N Michelen is a notable inventor based in Brooklyn, NY. He has made significant contributions to the field of electroplating, holding 2 patents that showcase his innovative approaches to metal deposition processes. His work has implications for various industries, particularly in improving the quality and uniformity of metal coatings.
Latest Patents
One of Michelen's latest patents is the "Programmed Pulse Electroplating Process." This invention relates to a method of electrodepositing metal onto a substrate. It involves applying a pulsed periodic reverse current across the electrodes of a plating cell, utilizing a peak reverse current density and peak forward current density. The process varies the ratio of these current densities in periodic cycles to achieve metal deposits of uniform thickness and appearance on the substrate. Additionally, it enhances the properties of the electrodeposit, especially on uneven surfaces or apertures, by employing programmed pulse periodic reverse current modulation. This method improves surface uniformity, grain structure, and leveling of the deposit while maintaining high current density throwing power.
Career Highlights
Throughout his career, David N Michelen has worked with several companies, including Learonal, Inc. and Shipley Company LLC. His experience in these organizations has allowed him to refine his skills and contribute to advancements in electroplating technology.
Collaborations
Michelen has collaborated with notable professionals in his field, including James L Martin and Stephane Menard. These partnerships have likely enriched his work and led to further innovations in the electroplating process.
Conclusion
David N Michelen stands out as an influential inventor in the realm of electroplating technology. His patents reflect a commitment to enhancing metal deposition methods, which can significantly impact various manufacturing processes.