Company Filing History:
Years Active: 2020-2021
Title: David Michael Corriveau: Innovator in Lithography Systems
Introduction
David Michael Corriveau is a notable inventor based in Sacramento, CA. He has made significant contributions to the field of lithography systems, holding a total of 2 patents. His work focuses on enhancing the efficiency and effectiveness of lithography processes, which are crucial in various manufacturing applications.
Latest Patents
One of David's latest patents is titled "Dynamic cooling control for thermal stabilization for lithography system." This invention provides a system, software application, and methods that aim to decrease stabilization time while writing exposure patterns into photoresist on substrates. The system includes a slab, a stage, a pair of supports, a processing apparatus, and a chiller system. The chiller system features fluid channels in each track, which help maintain optimal thermal conditions during the lithography process.
Career Highlights
David Michael Corriveau is currently employed at Applied Materials, Inc., where he continues to innovate and develop advanced technologies in the lithography domain. His expertise and contributions have positioned him as a key player in the industry.
Collaborations
Throughout his career, David has collaborated with talented individuals such as Benjamin M Johnston and Cheuk Ming Lee. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
David Michael Corriveau's work in lithography systems exemplifies the impact of innovation in technology. His patents and collaborations highlight his commitment to advancing the field and improving manufacturing processes.