Pittsford, NY, United States of America

David M Sturmer


Average Co-Inventor Count = 1.4

ph-index = 4

Forward Citations = 119(Granted Patents)


Location History:

  • Webster, NY (US) (1976)
  • Pittsford, NY (US) (1976 - 1977)
  • Rochester, NY (US) (1978)

Company Filing History:


Years Active: 1976-1978

Loading Chart...
7 patents (USPTO):Explore Patents

Title: The Innovative Contributions of David M. Sturmer

Introduction

David M. Sturmer is a notable inventor based in Pittsford, NY (US), recognized for his significant contributions to the field of photographic materials. With a total of 7 patents to his name, Sturmer has made advancements that enhance the quality and functionality of photographic processes.

Latest Patents

Sturmer's latest patents include innovative developments in photographic materials. One of his notable inventions is a photographic material containing an energy-sensitive organic compound. This material comprises specific dyes that, upon exposure, release a species that catalyzes the reduction of silver salt oxidizing agents in the presence of organic reducing agents. The photographic material is designed to be heated or processed in a physical developer to develop the image effectively. Another significant patent involves photographic supports and elements utilizing photobleachable dyes. These novel o-nitro-substituted arylidene dyes are designed to provide light-sensitive elements that can form images through exposure to light. The dyes also serve antihalation purposes in photothermographic elements and can be incorporated within silver halide emulsions to reduce internal light scattering.

Career Highlights

Sturmer's career is marked by his work at Eastman Kodak Company, where he has played a pivotal role in advancing photographic technology. His innovative approach has led to the development of materials that improve image quality and processing efficiency.

Collaborations

Throughout his career, Sturmer has collaborated with esteemed colleagues such as Wilbur S. Gaugh and Donald W. Heseltine. These collaborations have contributed to the successful development of various photographic technologies.

Conclusion

David M. Sturmer's contributions to the field of photography through his patents and innovations have significantly impacted the industry. His work continues to influence the development of advanced photographic materials and processes.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…