David M Lucas

Title: David M Lucas: Innovator in Water Absorbent Technologies

Introduction

David M Lucas is a notable inventor based in West Kirby, GB. He has made significant contributions to the field of water absorbent technologies, holding 2 patents that enhance the performance of polyacrylic polymer particles. His innovative methods have the potential to improve various applications in industries that require efficient water absorption.

Latest Patents

Lucas's latest patents focus on methods for increasing the size and absorption capabilities of fine water absorbent cross-linked polyacrylic polymer particles. The first patent describes a method that involves impregnating polymer particles with an acrylic monomer solution, which is then subjected to elevated temperatures to polymerize the impregnated monomer. This process results in a cross-linked polyacrylic polymer with enhanced water absorbance and increased particle size. The second patent outlines a method for enhancing the absorption of aqueous fluids by surface-contacting SAP polymer particles with a cross-linking agent solution, followed by drying the particles to form an acrylic SAP polymer with improved fluid absorption under load.

Career Highlights

David M Lucas is associated with the American Colloid Company, where he applies his expertise in polymer technology. His work has contributed to advancements in the field, particularly in the development of materials that can effectively manage water absorption.

Collaborations

Lucas has collaborated with notable colleagues, including John A Henderson and Anthony S Tomlin. Their combined efforts have fostered innovation and progress in the development of water absorbent technologies.

Conclusion

David M Lucas stands out as an influential inventor in the realm of water absorbent technologies. His patents reflect a commitment to enhancing the performance of polyacrylic polymers, which can lead to significant advancements in various applications.