Rochester, NY, United States of America

David M Attridge


Average Co-Inventor Count = 2.3

ph-index = 5

Forward Citations = 107(Granted Patents)


Company Filing History:


Years Active: 1985-2009

Loading Chart...
11 patents (USPTO):Explore Patents

Title: Innovations of David M Attridge

Introduction

David M Attridge is a notable inventor based in Rochester, NY (US). He has made significant contributions to the field of substrate inverter systems, holding a total of 11 patents. His work has advanced the technology used in various applications, particularly in the printing and imaging industries.

Latest Patents

Among his latest patents is a design for substrate inverter systems and methods. This invention features a sheet inverter that includes a curved sheet path, allowing for efficient handling of sheets. The sheet driver is designed to draw in the sheet and reverse its direction, ensuring smooth transitions between the exit path and the inverter path. Another notable patent involves an inverter with a slow speed drive mode, which enhances reliability. This substrate inverter includes an inversion channel that adjusts the speed of the output drive based on the position of the substrate, optimizing performance.

Career Highlights

David M Attridge has spent a significant portion of his career at Xerox Corporation, where he has been instrumental in developing innovative technologies. His expertise in substrate inverters has positioned him as a key figure in the advancement of printing technologies.

Collaborations

Throughout his career, David has collaborated with talented individuals such as Lam F Wong and Lisbeth Sophia Quesnel. These partnerships have contributed to the successful development of his patented technologies.

Conclusion

David M Attridge's contributions to the field of substrate inverter systems demonstrate his innovative spirit and technical expertise. His patents reflect a commitment to improving technology in the printing industry, making him a significant figure in the realm of inventions.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…