Location History:
- Enosburg Falls, VT (US) (2000 - 2002)
- Marblehead, MA (US) (2006)
Company Filing History:
Years Active: 2000-2006
Title: Innovations of David Louis Walker
Introduction
David Louis Walker is a notable inventor based in Enosburg Falls, Vermont. He has made significant contributions to the field of technology, particularly in the area of charged particle lithography and chemical mechanical polishing. With a total of seven patents to his name, Walker's work has had a substantial impact on the industry.
Latest Patents
One of Walker's latest patents is titled "Pattern compensation techniques for charged particle lithographic masks." This invention presents a method for producing a particle beam mask and mask structures that incorporate dummy fill shapes to overcome distortion in unexposed regions. By adding a dummy shape and applying a blocking layer, which can be an aperture or an additional mask, Walker's invention enhances the accuracy of lithographic processes.
Another significant patent is the "Method and apparatus for multiphase chemical mechanical polishing." This invention addresses the challenges of scratching insulating films and conductor lines on wafers during the CMP process. By introducing an aqueous solution to the polishing pad and wafer at various intervals, Walker's method improves the overall quality of the polishing procedure.
Career Highlights
David Louis Walker is currently employed at International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to further develop his innovative ideas and contribute to cutting-edge technology in the industry.
Collaborations
Throughout his career, Walker has collaborated with talented individuals such as Cuc Kim Huynh and Gary Joseph Beardsley. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.
Conclusion
David Louis Walker's contributions to the field of technology through his patents and innovations demonstrate his expertise and commitment to advancing the industry. His work continues to influence the development of new technologies and processes.