Location History:
- East Hartford, CT (US) (1995)
- East Hartland, CT (US) (1998)
Company Filing History:
Years Active: 1995-1998
Title: Innovations of David L Faye
Introduction
David L Faye is an accomplished inventor based in East Hartford, Connecticut. He has made significant contributions to the field of electrochemical technology, holding two patents that showcase his innovative spirit and technical expertise.
Latest Patents
One of his latest patents is the "Center post electrochemical cell stack." This invention is designed to generate product gases, such as oxygen, from supply fluids like water. The design includes a frame with a base plate and a wall that defines a cell chamber for housing at least one electrochemical cell. A T-cap, featuring a top plate and a center post, is secured to the wall of the frame, allowing for the containment of pressure generated during operation. This invention has potential applications in generating oxygen on board aircraft or spacecraft.
Another notable patent is the "Electrochemical cell having crossed-ridge sealing surface." This invention addresses fluid leakage in multi-layered systems, particularly in electrochemical cell devices. The crossed-ridge sealing surface consists of two sets of aligned ridges that create sealing cells around existing through apertures, enhancing fluid leakage restriction for various applications.
Career Highlights
David L Faye is currently employed at United Technologies Corporation, where he continues to innovate and develop new technologies. His work has contributed to advancements in electrochemical systems, making significant impacts in various industries.
Collaborations
Throughout his career, David has collaborated with notable colleagues, including Trent M Molter and Wilford J Armstrong. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
David L Faye's contributions to electrochemical technology through his patents demonstrate his commitment to innovation and excellence. His work not only advances the field but also has the potential to impact various applications in the future.