Location History:
- Columbia, MI (US) (2002)
- Columbia, MO (US) (2004 - 2006)
Company Filing History:
Years Active: 2002-2006
Title: The Innovative Contributions of David L. Buster from Columbia, MO
Introduction
David L. Buster is a notable inventor based in Columbia, Missouri, who has made significant contributions to the field of technology through his innovative patents. With a total of three patents to his name, Buster has demonstrated a strong commitment to advancing modern applications in electronic components and circuit designs.
Latest Patents
Among Buster's latest inventions is the patent for a "Partially etched dielectric film with conductive features." This invention offers partially etched dielectric films that include raised conductive features, along with methods for forming these features by partially etching the dielectric materials. Another significant patent is for a "Printed circuit substrate with controlled placement covercoat layer." This innovation describes a covercoated base substrate featuring a photoimageable covercoat layer that provides controlled offset distances, ensuring precise integration of printed circuits, including conductors and leads.
Career Highlights
David L. Buster is currently associated with 3M Innovative Properties Company, where his expertise in developing new technologies plays a crucial role in the company's research and development efforts. His contributions not only enhance the company's product offerings but also push the boundaries of technological advancements in the electronic industry.
Collaborations
Throughout his career, Buster has had the opportunity to collaborate with talented coworkers, including John B. Scheibner and Robert M. Anderton. These collaborations have fostered innovation and have contributed to the successes of their respective projects and patents.
Conclusion
David L. Buster's innovative spirit and contributions to technology have left an indelible mark on the industry. As a dedicated inventor with a keen focus on improving electronic components, his work continues to inspire and pave the way for future innovations.