Cambridgeshire, United Kingdom

David Kirkwood


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2012

Loading Chart...
1 patent (USPTO):Explore Patents

Title: David Kirkwood: Innovator in Ion Source Technology

Introduction: David Kirkwood, an accomplished inventor based in Cambridgeshire, GB, has made significant contributions to the field of ion implantation technology. With a focus on developing advanced ion sources, his work plays a crucial role in semiconductor manufacturing processes.

Latest Patents: David Kirkwood holds one patent titled "Cathode and Counter-Cathode Arrangement in an Ion Source." This invention relates to ion sources that include a cathode and a counter-cathode specifically designed for use in ion implanters. The innovation utilizes a vacuum-held ion source that generates ions through a plasma produced within an arc chamber. The patent details how plasma ions are extracted from the arc chamber for implantation onto semiconductor wafers. The design features a cathode that emits electrons into the arc chamber, an electrode positioned to receive these electrons, and a mechanism for adjusting voltage potential to switch the electrode's role between an anode and a counter-cathode.

Career Highlights: David Kirkwood is currently associated with Applied Materials, Inc., a leading company in the field of materials engineering and semiconductor manufacturing. His expertise and inventive spirit have contributed to the advancement of ion source technology, ultimately benefiting the semiconductor industry.

Collaborations: Throughout his career, David has collaborated with notable colleagues such as Andrew S. Devaney and Richard David Goldberg. These partnerships have fostered innovation in ion implantation techniques and have aided in the development of more efficient semiconductor manufacturing processes.

Conclusion: David Kirkwood's inventive work in ion source technology exemplifies his commitment to advancing semiconductor manufacturing. His patent demonstrates his proficiency in addressing industry challenges, thus contributing to the evolution of innovative solutions in ion implantation. With his ongoing efforts at Applied Materials, Inc., Kirkwood remains a vital figure in the realm of inventions and technology development.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…