Cary, NC, United States of America

David Kent Anderson

USPTO Granted Patents = 1 

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovations of David Kent Anderson

Introduction

David Kent Anderson is a notable inventor based in Cary, NC (US). He has made significant contributions to the field of semiconductor technology, particularly in the process of forming grid electrodes on silicon wafers. His innovative approach has implications for the efficiency and performance of solar cells and other electronic devices.

Latest Patents

David Kent Anderson holds a patent for the "Process of forming a grid electrode on the front-side of a silicon wafer." This process involves creating a front-grid electrode on a silicon wafer that has an anti-reflective coating (ARC) layer. The method utilizes thin parallel finger lines that are double printed from a metal paste. Notably, the metal pastes used for the first and second printing differ in their content of glass frit and may include other inorganic additives. This innovation enhances the manufacturing process of silicon wafers, contributing to advancements in the semiconductor industry.

Career Highlights

Anderson is currently employed at E.I. du Pont de Nemours and Company, a leading science and technology company known for its innovative solutions in various sectors. His work at DuPont has allowed him to further develop his expertise in materials science and engineering, particularly in the context of semiconductor fabrication.

Collaborations

Throughout his career, David Kent Anderson has collaborated with several talented individuals, including Russell David Anderson and Kenneth Warren Hang. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

David Kent Anderson's contributions to the field of semiconductor technology exemplify the impact of innovative thinking in advancing modern electronics. His patent for the process of forming grid electrodes on silicon wafers showcases his commitment to enhancing manufacturing techniques and improving product performance.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…