Ilford, United Kingdom

David James Hoolas

USPTO Granted Patents = 2 

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Ilford, GB (2022)
  • Iford, GB (2023)

Company Filing History:


Years Active: 2022-2023

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of David James Hoolas

Introduction

David James Hoolas is a notable inventor based in Ilford, GB. He has made significant contributions to the field of wellbore cementing, holding two patents that showcase his innovative methods. His work is particularly relevant in the oil and gas industry, where efficient cementing techniques are crucial for well integrity.

Latest Patents

Hoolas's latest patents include methods of cementing a wellbore without using a spacer fluid. One patent describes a method that involves injecting a non-aqueous fluid into the wellbore, followed by a cement slurry and a non-ionic surfactant composition. This composition includes an alkyl end-capped ethoxylated fatty alcohol and a chain extended non-ionic surfactant. Another patent outlines a similar method, emphasizing the use of the non-ionic surfactant composition to enhance the cementing process.

Career Highlights

Throughout his career, Hoolas has worked with prominent companies in the oil and gas sector. He has been associated with Baker Hughes Oilfield Operations LLC and BP Exploration Operating Company Limited. His experience in these organizations has contributed to his expertise in wellbore cementing techniques.

Collaborations

Hoolas has collaborated with several professionals in his field, including Angela Anh Doan and Antonio Bottiglieri. These collaborations have likely enriched his work and contributed to the development of his innovative patents.

Conclusion

David James Hoolas is a distinguished inventor whose work in wellbore cementing has made a significant impact in the oil and gas industry. His innovative methods and patents reflect his commitment to advancing technology in this critical field.

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