Company Filing History:
Years Active: 2004
Title: The Innovations of David J. Slavinski
Introduction
David J. Slavinski is an accomplished inventor based in Linden, NJ. He has made significant contributions to the field of polymer chemistry, particularly in the development of solvent-based poly(urethane/urea) resins. His innovative work has implications for various applications, including printing inks and coating compositions.
Latest Patents
David J. Slavinski holds a patent for "Solvent soluble poly(urethane/urea) resins." This patent describes a method for formulating flexographic and gravure laminating printing ink and coating compositions. The resin is created from a poly(urethane) prepolymer solution, which is made from a blend of polymeric diols and diols reacted with diisocyanates and then with diamine in an organic solvent. The controlled addition of the poly(urethane) prepolymer solution to the diamine allows for the formation of a resin solution that can be used without the need for adjuvants or additional grinding.
Career Highlights
David works at Sun Chemical Corporation, where he continues to innovate in the field of polymer chemistry. His work has been instrumental in advancing the technology behind printing inks and coatings, making them more efficient and effective.
Collaborations
Throughout his career, David has collaborated with notable colleagues, including Ralph Francis Arcurio and Mark Rocco. These partnerships have fostered a creative environment that encourages the development of new ideas and technologies.
Conclusion
David J. Slavinski's contributions to the field of polymer chemistry and his innovative patent demonstrate his commitment to advancing technology in printing applications. His work continues to influence the industry and inspire future innovations.