Location History:
- Clarendon Hills, IL (US) (1981)
- LaGrange Park, IL (US) (1984 - 1995)
Company Filing History:
Years Active: 1981-1995
Title: The Innovative Contributions of David J Kowalski
Introduction
David J Kowalski is a notable inventor based in LaGrange Park, IL (US). He has made significant contributions to the field of chemistry, particularly in the development of polymers. With a total of 9 patents to his name, Kowalski's work has had a considerable impact on various applications in the industry.
Latest Patents
Among his latest patents are the "Fluorescent monomer and polymer - 3-Hydroxy-2-methylene-3-(1-naphthyl)propionic acid, methyl ester and fluorescent water soluble polymers prepared therefrom." This invention focuses on creating fluorescent materials that can be utilized in various applications. Another significant patent is the "Process for producing sulfomethylamide polymers," which describes a method where polyacrylamide is reacted with formaldehyde and bisulfite at elevated temperatures and specific pH levels to produce sulfomethylpolyacrylamide.
Career Highlights
David Kowalski is currently employed at Nalco Chemical Company, where he continues to innovate and develop new chemical processes and materials. His expertise in polymer chemistry has been instrumental in advancing the company's research and product offerings.
Collaborations
Throughout his career, Kowalski has collaborated with several talented individuals, including Dodd W Fong and Thomas Aitken. These collaborations have fostered a creative environment that has led to the successful development of new technologies and products.
Conclusion
David J Kowalski's contributions to the field of chemistry and his innovative patents highlight his role as a significant inventor. His work continues to influence the industry and inspire future advancements in polymer technology.