David J Crowther

Title: The Innovations of David J Crowther

Introduction

David J Crowther is an accomplished inventor based in Farmington Hills, MI (US). He has made significant contributions to the field of optical technology, particularly in the development of X-ray optical elements. His innovative work has led to the creation of a patented technology that enhances the capabilities of X-ray dispersive elements.

Latest Patents

David J Crowther holds a patent for an X-ray optical element and method for its manufacture. This patent describes X-ray dispersive elements that comprise a stacked array of layer pairs of boron nitride and various metals, including nickel, tungsten, chromium, vanadium, iron, manganese, and cobalt. The boron nitride is preferably deposited through a planar magnetron sputtering process. This innovative approach allows for improved performance in X-ray applications.

Career Highlights

Throughout his career, David has been associated with Ovonic Synthetic Materials Company Inc., where he has contributed to advancements in synthetic materials and optical technologies. His work has been instrumental in pushing the boundaries of what is possible in the field of X-ray optics.

Collaborations

David has collaborated with notable professionals in his field, including his coworker George A Gutman. Their combined expertise has fostered innovation and development in optical technologies.

Conclusion

David J Crowther's contributions to the field of X-ray optical elements demonstrate his commitment to innovation and excellence. His patented technology continues to influence advancements in optical applications, showcasing the importance of his work in the industry.