David H Tomich

Title: David H Tomich: Innovator in Orientation-Patterned Templates

Introduction

David H Tomich is a notable inventor based in New Carlisle, OH (US). He has made significant contributions to the field of materials science, particularly in the fabrication of orientation-patterned templates. With a total of 4 patents to his name, Tomich's work has implications for various electronic and optical applications.

Latest Patents

One of Tomich's latest patents is a method for the fabrication of orientation-patterned templates on common substrates. This innovative method involves depositing a first layer of a first material on a common substrate using a far-from-equilibrium process. Following this, a first layer of a second material is deposited on the first layer by a close-to-equilibrium process, resulting in the formation of a first assembly. The materials used can vary, including options such as AlO (sapphire), silicon (Si), and germanium (Ge), among others. The first material may consist of electronic or optical binary materials, including AlN, GaN, and GaP, to name a few. The processes employed in this method include MOCVD and MBE for the far-from-equilibrium process, while HVPE is used for the close-to-equilibrium process.

Career Highlights

David H Tomich is currently associated with the United States of America as represented by the Secretary of the Air Force. His work has been instrumental in advancing the understanding and application of orientation-patterned templates in various technological fields.

Collaborations

Tomich has collaborated with notable coworkers, including Kurt G Eyink and Vladimir L Tassev. Their combined expertise has contributed to the successful development of innovative solutions in materials science.

Conclusion

David H Tomich stands out as a significant figure in the realm of materials innovation, particularly through his work on orientation-patterned templates. His contributions continue to influence advancements in electronic and optical technologies.