Company Filing History:
Years Active: 1999
Title: David F Nickelson: Innovator in Waste Containment Technology
Introduction
David F Nickelson is a notable inventor based in Idaho Falls, ID (US). He has made significant contributions to the field of waste containment technology. His innovative approach has led to the development of a unique apparatus designed to enhance environmental safety.
Latest Patents
David holds a patent for a Multi-layer waste containment barrier. This apparatus is specifically designed for constructing an underground containment barrier that effectively contains an in-situ portion of earth. The invention includes an excavating device that can simultaneously excavate earthen material from both beside and beneath the in-situ portion without removing it. This process creates an open side trench and a generally horizontal underground trench, both defined by opposing earthen sidewalls. Additionally, the apparatus features a barrier-forming device that constructs a side barrier within the open trench and a multi-layer barrier within the horizontal trench. The multi-layer barrier consists of at least a first layer and a second layer, providing enhanced containment capabilities.
Career Highlights
David is currently employed at Lockheed Martin Idaho Technologies Company, where he applies his expertise in innovative technologies. His work focuses on developing solutions that address environmental challenges and improve safety standards in waste management.
Collaborations
Throughout his career, David has collaborated with talented professionals, including Ann Marie Smith and Bradley M Gardner. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
David F Nickelson's contributions to waste containment technology exemplify the importance of innovation in addressing environmental issues. His patented apparatus represents a significant advancement in the field, showcasing his commitment to creating safer and more effective solutions.