Rochester, NY, United States of America

David F Kopperl


Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 1993-2003

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2 patents (USPTO):Explore Patents

Title: David F Kopperl: Innovator in Light Sensitive Materials

Introduction

David F Kopperl is a notable inventor based in Rochester, NY (US). He has made significant contributions to the field of light sensitive materials, holding a total of 2 patents. His work primarily focuses on improving the performance and archival properties of photographic materials.

Latest Patents

Kopperl's latest patents include an "Apparatus including sulfur bulb for accelerating fading of light sensitive materials." This innovative apparatus minimizes heat generation while subjecting light sensitive materials to visible radiation. It features a source of visible radiation that includes at least one microwave energy responsive sulfur bulb, which emits visible light when activated by microwave energy. Additionally, the apparatus is designed with a holder that receives light sensitive materials and a light diffusing assembly that ensures uniform illumination.

Another significant patent is the "Method for improving the archival properties of processed photographic film." This method enhances the longevity of photographic films by utilizing a storage assembly that places the film in a sealed container with molecular sieve zeolites. This innovative approach aims to preserve the quality of photographic materials over time.

Career Highlights

David F Kopperl is associated with Eastman Kodak Company, a leader in imaging and photographic technology. His work at Kodak has allowed him to explore and develop new technologies that enhance the capabilities of photographic materials.

Collaborations

Kopperl has collaborated with notable colleagues such as Arunachalam T Ram and Carl F Holtz. These collaborations have contributed to the advancement of technologies in the field of light sensitive materials.

Conclusion

David F Kopperl's contributions to the field of light sensitive materials through his innovative patents and work at Eastman Kodak Company highlight his role as a significant inventor. His advancements continue to influence the industry and improve the quality of photographic materials.

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