Company Filing History:
Years Active: 2012
Title: David D. Blackwell: Innovator in Plasma Measurement Technologies
Introduction
David D. Blackwell is a notable inventor based in Alexandria, VA (US). He has made significant contributions to the field of plasma measurement technologies, holding 2 patents that showcase his innovative approach to determining plasma parameters.
Latest Patents
One of his latest patents is the "LC resonance probe for determining local plasma density." This apparatus and method are designed to measure plasma parameters such as plasma electron density (n). The probe consists of an LC resonance probe with an inductive element and a capacitive element connected in series. The capacitive element can take various forms, including a parallel plate capacitor, a cylindrical capacitor, or a spherical capacitor. The unique configuration of the probe allows it to exhibit a characteristic resonance frequency, which can be analyzed to determine plasma density.
Another significant patent is the "RF probe technique for determining plasma potential." In this invention, an RF probe is placed within a plasma, and an RF signal from a network analyzer is applied with a given DC bias voltage. The frequency applied is less than the plasma frequency, ensuring it is outside the resonant absorption range typically used for electron density determination. By applying bias voltages in a series of steps, the real part of the plasma's complex impedance is measured, allowing for the determination of the plasma potential.
Career Highlights
David D. Blackwell works for the USA as represented by the Secretary of the Navy. His work focuses on advancing technologies that enhance the understanding and measurement of plasma characteristics.
Collaborations
He has collaborated with notable colleagues, including David N. Walker and Richard F. Fernsler, contributing to the development of innovative solutions in plasma measurement.
Conclusion
David D. Blackwell's contributions to plasma measurement technologies through his patents reflect his dedication to innovation in this specialized field. His work continues to influence advancements in understanding plasma parameters, showcasing the importance of his inventions.