Ocoee, FL, United States of America

David C Rees

This inventor holds 1 USPTO granted patent and 1 published patent application, plus 1 CIPO patent and 1 EPO patent. Top assignee: Tdw Delaware, Inc.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David C Rees. Retrieved from https://idiyas.com/inventor/david-c-rees-hfwsn37b

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0


 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Innovations of David C Rees in Inline Inspection Technology

Introduction

David C Rees is an accomplished inventor based in Ocoee, FL (US). He has made significant contributions to the field of inline inspection technology, particularly through his innovative patent that enhances the capabilities of inspection tools used in various industries.

Latest Patents

One of David C Rees's notable patents is the "Pipeline tool with composite magnetic field for inline inspection." This invention features a plurality of composite field systems arranged circumferentially around the body of the inline inspection tool. Each composite field system includes multiple magnetic circuits designed to produce a composite or resultant angled field relative to the target. The tool is equipped with a sensor array configured for magnetic flux leakage (MFL) or magnetostrictive electro-magnetic acoustic transducers (EMAT) implementations. The orientation of the pole magnets in the axial direction of the tool body allows for innovative design geometries that were not previously possible with traditional single-circuit helical MFL designs and EMAT designs.

Career Highlights

David C Rees is associated with Tdw Delaware, Inc., where he applies his expertise in developing advanced inspection technologies. His work has been instrumental in improving the efficiency and effectiveness of inline inspection processes.

Collaborations

Throughout his career, David has collaborated with notable colleagues, including Todd Mendenhall and Todd R Mendenhall. These collaborations have contributed to the advancement of technology in the field of inline inspection.

Conclusion

David C Rees's innovative contributions to inline inspection technology demonstrate his commitment to enhancing industry standards. His patent reflects a significant advancement in the capabilities of inspection tools, paving the way for future innovations in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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