Company Filing History:
Years Active: 1980
Title: David C. Cosman: Innovator in Thin Film Interconnection Systems
Introduction
David C. Cosman, an accomplished inventor based in Newburgh, NY, has made significant contributions to the field of semiconductor technology. His work focuses on developing methods that enhance the efficiency and effectiveness of thin film interconnection systems.
Latest Patents
Cosman's most notable patent addresses the method of forming thin film interconnection systems. This innovative method involves creating thin film interconnection patterns on substrates, particularly those made from semiconductor materials. The patent highlights a unique use of the passivation layer, such as glass, which serves as a stable masking material for etching conductive lines. Furthermore, the metal conductor acts as a stable mask during the etching of glass to create via holes. This method provides a practical resist system that is compatible with reactive ion etching and other dry etching processes, showcasing the ingenuity behind modern semiconductor manufacturing.
Career Highlights
Currently, David C. Cosman is associated with IBM (International Business Machines Corporation), where he continues to contribute to advancements in technology. His extensive knowledge and innovative spirit have allowed him to be at the forefront of research and development in semiconductor processes.
Collaborations
Throughout his career, Cosman has collaborated with esteemed colleagues, including Kenneth Chang and Helmut M. Gartner. These collaborative efforts have fostered an environment of creativity and innovation, allowing for the exploration of new ideas and technologies within the electronics industry.
Conclusion
David C. Cosman represents the spirit of innovation within the complex field of semiconductor technology. With his pioneering patent and valuable contributions to IBM, he continues to influence the future of thin film interconnection systems. His work not only enhances current manufacturing processes but also sets the stage for future advancements in the industry.