Company Filing History:
Years Active: 1997
Title: David Bollinger: Innovator in Plasma Assisted Chemical Etching
Introduction
David Bollinger is a notable inventor based in Ridgefield, Connecticut. He has made significant contributions to the field of chemical etching, particularly in the context of large flat panel displays. His innovative approach has led to the development of a unique patent that enhances the precision of circuit pattern formation.
Latest Patents
David Bollinger holds a patent for "Localized plasma assisted chemical etching through a mask." This invention describes a system designed for the formation of circuit patterns on large flat panel displays using plasma-assisted chemical etching. The process allows for a uniform or controllably nonuniform etch depth across the display area. The invention involves placing a substrate adjacent to a plasma etching tool, which is smaller than the substrate's surface area. The tool is then scanned across the substrate to transfer the pattern from a photolithographic mask onto the film. This method aims to optimize the etching process by generating a dwell time versus position map for the overlying film.
Career Highlights
David Bollinger is currently employed at Ipec Precision Inc., where he continues to innovate in the field of precision etching technologies. His work has been instrumental in advancing the capabilities of manufacturing processes for electronic displays. He collaborates closely with his coworker, Jim Nester, to further enhance the applications of their technologies.
Collaborations
Due to space constraints, the details of collaborations will not be included.
Conclusion
David Bollinger's contributions to the field of plasma-assisted chemical etching represent a significant advancement in display technology. His innovative patent showcases his expertise and commitment to improving manufacturing processes.